衬底温度对Fe-N薄膜结构、 形貌及磁性能的影响 - TNMSC 关键字: Fe-N薄膜; 衬底温度; 磁性能[gap=1198]Key words: Fe-N thin films; substrate temperature; magnetic properties
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基片温度对WO 关键字: 三氧化钨;薄膜;基片温度;二氧化氮;气体传感器[gap=1276]Key words: tungsten oxide; thin film; substrate temperature; nitrogen dioxide; gas sensor
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...:Sc2O3薄膜 沉积温度 光学性能 结构性能 激光损伤阈值 破坏机理 [gap=1892]Key words:Sc2O3 thin films; substrate temperature; optical properties; microstructure properties; laser induced damage threshold;..
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Substrate temperature,deposition pressure and sputtering power have great influences on the film surface morphology.
2.衬底温度、沉积压强和溅射功率等因素对薄膜的表面形貌有很大的影响。
参考来源 - 透明的高导电近红外反射ZnO:Ga薄膜的制备及特性研究And among these processing parameters, the substrate temperature and bias have the more prominent influences.
其中硬度随基片温度和基片偏压的变化较为显著。
参考来源 - 超硬薄膜CNThe XRD analyses reveal that the crystalline quality of the films improved with the increase of the substrate temperature.
X射线衍射研究发现,薄膜晶体的质量随着衬底温度的提高而增加。
参考来源 - ZnO薄膜的表面形貌与应力特性研究Glow Plasma Assisted I-lot Filament Chemical Vapor Deposistion are adopted in experiments. The perpose is to reduce substrate temperature in order to realize low temperature synthesis of high quality diamond films and establish primary theoretical model of low temperature synthesis.
实验采用辉光等离子体辅助热丝CVD技术,目的是降低衬底基片温度,以实现高品质金刚石薄膜的低温合成,研究金刚石薄膜的低温合成机理,建立其初步的理论模型。
参考来源 - 金刚石薄膜低温合成的研究The strength of the sample tested by XRD increases with the substrate temperature increasing.
XRD测试样品峰的强度随基底温度升高明显增强。
参考来源 - 高密度磁记录磁头材料FeWith the raise of substrate temperature, the surface roughness of LaF_3 single layer increased.
LaF_3表面粗糙度随基板温度升高而增大。
参考来源 - AlIn addition,the effects of substrate temperature,deposition rate,magnetic-field distribution, magnetic-field intensity,minus bias of the target,pressure of the chamber and target-substrate distance on the physical properties of thin film are studied.
本论文研究了基板温度、溅射速率、磁场分布、磁场强度、阴极靶负偏压、真空室内压强以及靶材-基板间距对成膜的影响。
参考来源 - 磁控溅射薄膜生长的计算机模拟研究·2,447,543篇论文数据,部分数据来源于NoteExpress
In addition, the optical loss increases with substrate temperature rising.
此外,随着基板温度的提高,损耗也会有所增加。
This effect is very significant at low substrate temperature or high deposition rate.
而且能量的影响在较低的基片温度或是较高的沉积速率时更加显著。
The maximum attractive force, yield force and rupture force decrease with increasing substrate temperature.
针尖和基体之间的最大引力、屈服力和断裂力随着基体温度的增加而减小。
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